PlasmaProTM System100 is a flexible and powerful solution for plasma etching and deposition processes.

• The load-locked wafer entry allows fast wafer exchange, the widest range of process gases and an extended process temperature range.
• Allowing maximum process flexibility for compound semiconductor, optoelectronics, photonics, MEMS and microfluidics applications, the PlasmaPro System100 plasma etcher and deposition tool can have many configurations.

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