METRYX, Ltd.

High Precision Mass Metrology Tools

MASS CHANGE: A DIRECT MEASUREMENT OF PROCESS PERFORMANCE

The Metryx mentor range is an in-line process monitoring solution which rapidly identifies production wafer trends and excursions. Monitoring the mass change for any process step is an effective in-line check, revealing the true wafer mean; while flagging bad wafers.

Key Features of Metryx Mass Metrology tools
• On-Product Measurement

• Non-invasive

• Atomic level accuracy

• Applicable to all process modules - deposition, etch and CMP, on metals and dielectrics

• High throughput in-line solution

• Self-contained corroboration of metrology result

• No monitor wafers or test sites required

• Low CoO

• User friendly software with recipe editing and configurable user security

The measurement encompasses etch depth & profile, material composition, deposition step coverage or gap-fill result. Metryx enables increased metrology coverage on product wafers without compromising throughput, allowing complex, analytical metrology tools to be effectively applied where required on failed wafers.

For more information please visit www.metryx.net